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Kinya Usuda
Institution:
Nuflare Technology, Inc. (Japan)
Observed institution:
Nuflare Technology, Inc. (Japan)
OpenAlex ID:
A5020965293
Novel EUV mask inspection tool with 199-nm laser source and high-resolution optics
2009
·
Nobutaka Kikuiri
, Masatoshi Hirono
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
5
Development of advanced mask inspection optics with transmitted and reflected light image acquisition
2007
·
Ryoichi Hirano
, Riki Ogawa
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
4
Development of next-generation mask inspection method by using the feature of mask image captured with 199-nm inspection optics
2006
·
Yoshitake Tsuji
, Nobutaka Kikuiri
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
4
Development of advanced reticle inspection apparatus for hp 65-nm node device and beyond
2006
·
Nobutaka Kikuiri
, Shingo Murakami
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
4
Defect printability analysis by lithographic simulation from high resolution mask images
2009
·
George Chen
, James N. Wiley
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
2
Mask data rank and printability verification function of mask inspection system
2010
·
Kenichi Takahara
, Masakazu Tokita
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
Printability verification function of mask inspection system
2009
·
Hideo Tsuchiya
, Masaki Yamabe
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
Evaluation of EUVL mask pattern defect inspection using 199nm inspection tool with super-resolution method
2009
·
Hiroyuki Shigemura
, Tsuyoshi Amano
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
Mask-LMC: lithographic simulation and defect detection from high-resolution mask images
2009
·
George Chen
, James N. Wiley
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
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Works count:
9
Citation count:
22
H-index:
4
I10-index:
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