Work

Study of EUVL mask defect inspection using 199-nm inspection tool with super-resolution method

Year: 2009

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.829748

Authors: Hiroyuki Shigemura, Tsuyoshi Amano, Yukiyasu Arisawa, Osamu Suga, Hideaki Hashimoto, Masanori Saito, Masaya Takeda, Nobutaka Kikuiri, Ryoichi Hirano

Institutions: Semiconductor Leading Edge Technologies, Inc (Japan), Nuflare Technology, Inc. (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1990609039

FWCI: 1.405

Cites: 2

Cited by: 4

Related to: 10