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M. Hendriks
Observed names:
M. HENDRIKS,
Menso Hendriks
Observed institutions:
ASM International (Netherlands),
Fraunhofer Institute for Silicon Technology,
IMEC,
Philips (Netherlands),
Delft University of Technology
OpenAlex ID:
A5113853732
Plasma-enhanced growth and composition of silicon oxynitride films
1986
·
C. M. M. Denisse
, K. Z. Troost
, et al.
·
Journal of Applied Physics
·
92
Annealing of plasma silicon oxynitride films
1986
·
C. M. M. Denisse
, K. Z. Troost
, et al.
·
Journal of Applied Physics
·
74
Additional X-ray and electron diffraction peaks of polycrystalline silicon films
1984
·
M. Hendriks
, S. Radelaar
, et al.
·
Thin Solid Films
·
40
Practical accuracy analysis of some existing effective channel length and series resistance extraction methods for MOSFET's
1998
·
S. Biesemans
, M. Hendriks
, et al.
·
IEEE Transactions on Electron Devices
·
32
Phosphorus Doped Polysilicon for Double Poly Structures: I . Morphology and Microstructure
1991
·
M. Hendriks
, C. Mavero
·
Journal of The Electrochemical Society
·
32
PDF
An Industrial LPCVD Process for In Situ Phosphorus‐Doped Polysilicon
1990
·
J. G. M. Mulder
, P. Eppenga
, et al.
·
Journal of The Electrochemical Society
·
24
Combined impurity gettering and defect passivation in polycrystalline silicon solar cells
1990
·
L. A. Verhoef
, P-P. Michiels
, et al.
·
Applied Physics Letters
·
22
Accurate determination of channel length, series resistance and junction doping profile for MOSFET optimisation in deep submicron technologies
2002
·
S. Biesemans
, M. Hendriks
, et al.
·
Symposium on VLSI Technology
·
15
Phosphorus Doped Poly Silicon for Double Poly Structures: II . Electrical Characteristics
1991
·
M. Hendriks
, C. Mavero
·
Journal of The Electrochemical Society
·
15
PDF
Hydrogen passivation of polycrystalline silicon solar cells by plasma deposition of silicon nitride
2002
·
P.P. Michiels
, L.A. Verhoef
, et al.
·
Conference record of the IEEE Photovoltaic Specialists Conference
·
12
X-ray diffraction study and electrical characterization of boron-implanted low-pressure chemical vapor deposited polycrystalline silicon layers
1984
·
M. Hendriks
, R. Delhez
, et al.
·
Journal of Applied Physics
·
8
Oxynitridation of Silicon and Postnitridation of Thermal Silicon Oxide in N 2 O in a Vertical Furnace
1997
·
P. Lange
, H. Boneß
, et al.
·
Journal of The Electrochemical Society
·
7
PDF
FOM-Institute for Atomic and Molecular Physics, Amsterdam, * R&S Renewable Energy Systems B.V., Eindhoven, ** ASM Microelectronics Technology Centre, Bilthoven, The Netherlands.
1990
·
M. Hendriks
·
7
Plasma-induced fixed oxide charge
1989
·
Jan Bos
, Menso Hendriks
·
Journal of Applied Physics
·
6
X-ray diffraction study of polycrystalline silicon layers
1985
·
M. Hendriks
·
Research Repository (Delft University of Technology)
·
3
Morphology and Resistivity of Cvd Polycrystalline Silicon Layers Containing Carbon
1982
·
M. Hendriks
, S. Radelaar
, et al.
·
Le Journal de Physique Colloques
·
3
Interface engineering in silicon semiconductor processing using a vacuum cluster tool
1994
·
M. Hendriks
·
Microelectronic Engineering
·
2
Cluster-Tool Integrated HF Vapor Etching for Native Oxide Free Processing
1993
·
Chris Werkhoven
, Ernst Granneman
, et al.
·
MRS Proceedings
·
2
Characterization and Optimization of the Lpcvd Silicon Oxynitride Process, Using the Design of Experiments Method
1991
·
L. J. de LEGÉ
, M. HENDRIKS
·
Journal de Physique IV (Proceedings)
·
2
Reduction of Bitline to Control Gate Leakage for Improved Embedded 0.18 um FLASH Yield and Reliability
2002
·
A. Cacciato
, S. Nelson
, et al.
·
European Solid-State Device Research Conference
·
1
Poly-gate structures manufactured in a cluster tool
1993
·
M. Hendriks
, R. de Blank
, et al.
·
Applied Surface Science
·
1
A Comparative Study of Surface Particle Counters
1989
·
Ch. M. Baas
, H. P. Lengkeek
, et al.
·
Journal of The Electrochemical Society
·
1
PDF
An Industrial Process for Bpsg-teos
1989
·
P. EPPENGA
, E. SCHUIVENS
, et al.
·
Le Journal de Physique Colloques
·
1
Control gate patterning optimisation for improved yield of 0.18um embedded FLASH technology
2001
·
M. Hendriks
, E. Gerritsen
, et al.
·
European Solid-State Device Research Conference
MASIF: Material growth on an atomic scale for the realization of different kind of junctions for advanced nanometer-scale devices
2000
·
Dave H. A. Blank
, H. Verweij
, et al.
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Works count:
32
Citation count:
402
H-index:
10
I10-index:
10
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