Work

X-ray diffraction study and electrical characterization of boron-implanted low-pressure chemical vapor deposited polycrystalline silicon layers

Year: 1984

Type: article

Source: Journal of Applied Physics

DOI: 10.1063/1.333806

Authors: M. Hendriks, R. Delhez, Th. H. de Keijser, S. Radelaar, F. H. P. M. Habraken, A. E. T. Kuiper, P. R. Boudewijn

Institutions: Delft University of Technology, Philips (Netherlands), Signify (Netherlands)

Language: English

Topic: Semiconductor materials and interfaces

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1986018632

FWCI: 0.278

Cites: 36

Cited by: 8

Related to: 10