Work

Multiple epitaxial Si film deposition by APCVD for power semiconductors

Year: 2015

Type: conference-paper

Source: ASMC proceedings

DOI: 10.1109/asmc.2015.7164439

Authors: Matthias Kunle, Johannes Baumgartl, Katrin Koren, Olaf Fiedler

Institutions: Infineon Technologies (Austria), Infineon Technologies (Germany)

Language: English

Topic: Silicon Carbide Semiconductor Technologies

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1479940591

FWCI: 1.665

Cites: 3

Cited by: 5

Related to: 10