Work

Nanosession: Atomic Layer Deposition

Year: 2012

Type: book-chapter

Source: Frontiers in Electronic Materials

DOI: 10.1002/9783527667703.ch61

Authors: Cheol Seong Hwang, Woongkyu Lee, Jeong Hwan Han, Woojin Jeon, Yeon Woo Yoo, Changhee Ko, Julien Gatineau, Cheol Seong Hwang, B. Gouat, U. Weber, Peter K. Baumann, Michael Heuken, B. Lu, S. Hoffmann‐Eifert, M. Reiners, N. Aslam, I. Kärkkänen, J. H. Kim, R. Waser, M. Reiners, N. Aslam, S. Hoffmann‐Eifert, R. Waser, Taeyong Eom, Taehong Gwon, Si Jung Yoo, Moo‐Sung Kim, Manchao Xiao, Iain Buchanan, Cheol Seong Hwang

Institutions: Seoul National University, Air Liquide Laboratories (Japan), Aixtron (Germany), Forschungszentrum Jülich, Jülich Aachen Research Alliance, RWTH Aachen University, Air Products (United States)

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1544590909

FWCI:

Cites: 11

Cited by:

Related to: 10