Get started
Author

Manchao Xiao

Diadamantylsilylene and its stereochemistry of addition
1991 · Dong Ho Pae, Manchao Xiao, et al. · Journal of the American Chemical Society · 98
The quest for triplet ground state silylenes
2002 · Peter P. Gaspar, Manchao Xiao, et al. · Journal of Organometallic Chemistry · 68
Conformal Formation of (GeTe2)(1–x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
2012 · Taeyong Eom, Seol Choi, et al. · Chemistry of Materials · 61
On the Mechanisms of SiO 2 Thin-Film Growth by the Full Atomic Layer Deposition Process Using Bis( t -butylamino)silane on the Hydroxylated SiO 2 (001) Surface
2011 · Bo Han, Qingfan Zhang, et al. · The Journal of Physical Chemistry C · 53
On the Dissociative Chemisorption of Tris(dimethylamino)silane on Hydroxylated SiO 2 (001) Surface
2009 · Jiaye Li, Jinping Wu, et al. · The Journal of Physical Chemistry C · 48
Atomic Layer Deposition of Silicon Dioxide Using Aminosilanes Di- sec -butylaminosilane and Bis( tert -butylamino)silane with Ozone
2016 · Luis Fabián Peña, Charith E. Nanayakkara, et al. · The Journal of Physical Chemistry C · 47
Density functional theory study on the full ALD process of silicon nitride thin film deposition via BDEAS or BTBAS and NH 3
2014 · Liang Huang, Bo Han, et al. · Physical Chemistry Chemical Physics · 39
Atomic Layer Deposition of GeTe and Ge–Sb–Te Films Using HGeCl3, Sb(OC2H5)3, and {(CH3)3Si}2Te and Their Reaction Mechanisms
2017 · Taehong Gwon, Taeyong Eom, et al. · Chemistry of Materials · 37
Atomic Layer Deposition of GeTe Films Using Ge{N[Si(CH3)3]2}2, {(CH3)3Si}2Te, and Methanol
2016 · Taehong Gwon, Taeyong Eom, et al. · Chemistry of Materials · 36
Stereocontrolled double ring expansion of fused allylidenecyclopropanes. A novel route to hydroazulenes and other fused bicyclic systems
1993 · Craig A. Shook, Matthew L. Romberger, et al. · Journal of the American Chemical Society · 32
Designing high performance precursors for atomic layer deposition of silicon oxide
2014 · Anupama Mallikarjunan, Haripin Chandra, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 30
Combined Ligand Exchange and Substitution Reactions in Atomic Layer Deposition of Conformal Ge2Sb2Te5 Film for Phase Change Memory Application
2015 · Taeyong Eom, Taehong Gwon, et al. · Chemistry of Materials · 28
Silicon precursor development for advanced dielectric barriers for VLSI technology
2011 · Anupama Mallikarjunan, Andrew D. Johnson, et al. · Microelectronic Engineering · 28
Influence of the Kinetic Adsorption Process on the Atomic Layer Deposition Process of (GeTe2)(1–x)(Sb2Te3)x Layers Using Ge4+–Alkoxide Precursors
2014 · Taeyong Eom, Taehong Gwon, et al. · Chemistry of Materials · 24
First-Principles Study of a Full Cycle of Atomic Layer Deposition of SiO2Thin Films with Di(sec-butylamino)silane and Ozone
2013 · Liang Huang, Bo Han, et al. · The Journal of Physical Chemistry C · 22
Chemical interaction and ligand exchange between a [(CH 3 ) 3 Si] 3 Sb precursor and atomic layer deposited Sb 2 Te 3 films
2014 · Taeyong Eom, Taehong Gwon, et al. · Journal of Materials Chemistry C · 16
In Situ Infrared Absorption Study of Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride
2018 · Luis Fabián Peña, Eric C. Mattson, et al. · Langmuir · 11
Atomic layer deposition of carbon doped silicon oxide by precursor design and process tuning
2018 · Meiliang Wang, Haripin Chandra, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 7
Nanosession: Atomic Layer Deposition
2012 · Cheol Seong Hwang, Woongkyu Lee, et al. · Frontiers in Electronic Materials
Precursor design and engineering for low-temperature deposition of gate dielectrics for thin film transistors
2011 · Anupama Mallikarjunan, Laura M Matz, et al. · MRS Proceedings
Works count: 20
Citation count: 685
H-index: 16
I10-index: 17
Year
Topic
Type