Work

BEST: a BiCMOS-compatible super-self aligned ECL technology

Year: 2002

Type: conference-paper

Source: Custom Integrated Circuits Conference

DOI: 10.1109/cicc.1990.124769

Authors: K.G. Moerschel, T.Y. Chiu, W.A. Possanza, K.S. Lau, R.G. Swartz, R.A. Mantz, T.Y.M. Liu, K.F. Lee, V.D. Archer, G.R. Hower, G.T. Mazsa, R.E. Carsia, J.A. Pavlo, M.P. Ling, J.L. Dolcin, F.M. Erceg, J.J. Egan, C.J. Fassl, J.T. Glick, M.A. Prozonic

Institution: AT&T (United States)

Language: English

Topic: Advancements in Semiconductor Devices and Circuit Design

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1555422158

FWCI: 0.356

Cites: 1

Cited by: 12

Related to: 10