Implantation characteristics by boron cluster ion implantation
Year: 2006
Type: conference-paper
Source: AIP conference proceedings
DOI: 10.1063/1.2401491
Institutions: Nissin Ion Equipment Co., Ltd. (Japan), Fujitsu (Japan)
Language: English
Subfield: Surfaces, Coatings and Films
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W1587249792
