Work

Sputtering of Metals with 20 keV O2 +; Characteristic Etch Patterns, Sputtered Atom Yields and Secondary Ion Mass Spectra

Year: 1982

Type: book-chapter

Source: Springer series in chemical physics

DOI: 10.1007/978-3-642-88152-7_31

Authors: K. Tsunoyama, T. Suzuki, Y. Ohashi, M. Konishi

Language: English

Topic: Ion-surface interactions and analysis

Subfield: Surfaces, Coatings and Films

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1683964

FWCI: 0.772

Cites: 5

Cited by: 1

Related to: 10