Work

Kinetics of Ni3Si2 formation in the Ni2Si–NiSi thin film reaction from in situ measurements

Year: 2007

Type: article

Source: Applied Physics Letters

DOI: 10.1063/1.2822411

Authors: J. A. Kittl, M. A. Pawlak, C. Torregiani, A. Lauwers, C. Demeurisse, C. Vrancken, P. P. Absil, S. Biesemans, C. Detavernier, J. Jordan-Sweet, C. Lavoie

Institutions: IMEC, Ghent University, IBM Research - Thomas J. Watson Research Center

Language: English

Topic: Semiconductor materials and interfaces

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W194547552

FWCI: 0.342

Cites: 11

Cited by: 14

Related to: 10