Nonvolatile Polycrystalline-Silicon Thin-Film-Transistor Silicon–Oxide–Nitride–Oxide–Silicon Memory with Periodical Finlike Channels Fabricated Using Nanoimprint Technology
Year: 2013
Type: article
Source: Applied Physics Express
Authors: Henry J. H. Chen, Chien-Jen Huang
Institution: National Chi Nan University
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W1965047745