Atmospheric pressure plasma chemical vapor deposition system for high-rate deposition of functional materials
Year: 2000
Type: article
Source: Review of Scientific Instruments
DOI: 10.1063/1.1305510
Authors: Y. Mori, K. Yoshii, H. Kakiuchi, K. Yasutake
Institution: The University of Osaka
Language: English
Subfield: Radiology, Nuclear Medicine and Imaging
Field: Medicine
Domain: Health Sciences
Open Access status: closed
OpenAlex ID: W1968347199