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Novel technology of automatic macro inspection for 32-nm node and best focus detection

Year: 2007

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.711410

Authors: Kazuhiko Fukazawa, Kazumasa Endo, Kiminori Yoshino, Yuichiro Yamazaki

Institutions: Nikon (Japan), Toshiba (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W1968440608

FWCI:

Cites:

Cited by: 3

Related to: 10