Work

Pattern collapse mitigation strategies for EUV lithography

Year: 2012

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.915431

Authors: Dario L. Goldfarb, Robert L. Bruce, James J. Bucchignano, David P. Klaus, Michael A. Guillorn, Chunghsi J. Wu

Institutions: IBM (United States), IBM Research - Thomas J. Watson Research Center

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1970683060

FWCI: 2.844

Cites:

Cited by: 41

Related to: 10