Work

Reactive ion etching of thin chromium films using a two-layer resist system of polyimide and evaporated silver halide

Year: 1986

Type: article

Source: Thin Solid Films

DOI: 10.1016/0040-6090(86)90402-5

Authors: B. Spangenberg, V. Orlinov, G. Danev, E. Spasova, J. Malinovski

Institutions: Bulgarian Academy of Sciences, Institute of Electronics

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1972208231

FWCI:

Cites: 22

Cited by: 3

Related to: 10