Thickness determination for SiO2 films on Si by X-ray reflectometry at the Si K edge
Year: 2004
Type: article
Source: Thin Solid Films
Authors: M Krumrey, M Hoffmann, G Ulm, K Hasche, P Thomsen-Schmidt
Institution: Physikalisch-Technische Bundesanstalt
Language: English
Subfield: Radiation
Field: Physics and Astronomy
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W1977412007