Nickel solubility in intrinsic and doped silicon
Year: 2004
Type: article
Source: Journal of Applied Physics
DOI: 10.1063/1.1836852
Authors: A. A. Istratov, P. Zhang, R. J. McDonald, A. R. Smith, M. Seacrist, J. Moreland, J. Shen, R. Wahlich, E. R. Weber
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
Funder: National Science Foundation
OpenAlex ID: W1978665269