Work

Directed self-assembly of PS-b-PDMS into 193nm photoresist patterns and transfer into silicon by plasma etching

Year: 2014

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.2047287

Authors: Sophie Archambault, Cécile Girardot, Mathieu Salaün, Michael Delalande, Sophie Böhme, Gilles Cunge, Erwine Pargon, Olivier Joubert, Marc Zelsmann

Institutions: Centre National de la Recherche Scientifique, Université Joseph Fourier, Commissariat à l'Énergie Atomique et aux Énergies Alternatives

Language: English

Topic: Block Copolymer Self-Assembly

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funder: European Commission

OpenAlex ID: W1980586185

FWCI: 4.543

Cites: 30

Cited by: 5

Related to: 10