Work

Analysis of diffraction orders including mask topography effects for OPC optimization

Year: 2007

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.711757

Authors: Yuichi Inazuki, Nobuhito Toyama, Takashi Adachi, Takaharu Nagai, Takanori Suto, Yasutaka Morikawa, Hiroshi Mohri, Naoya Hayashi

Institution: Dai Nippon Printing (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1983197859

FWCI: 1.506

Cites:

Cited by: 4

Related to: 10