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Yuichi Inazuki
Observed names:
Y. Inazuki,
Yuichi INAZUKI
Institution:
Dai Nippon Printing (Japan)
Observed institutions:
Dai Nippon Printing (Japan),
The University of Tokyo
OpenAlex ID:
A5113542209
Demonstration of defect free EUV mask for 22nm NAND flash contact layer using electron beam inspection system
2011
·
Takeya Shimomura
, Satoshi Kawashima
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
17
Short-range electron backscattering from EUV masks
2010
·
Hiroyoshi Tanabe
, Tsukasa Abe
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
13
Decomposition difficulty analysis for double patterning and the impact on photomask manufacturability
2008
·
Yuichi Inazuki
, Nobuhito Toyama
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
10
Study of EUV mask defect repair using FIB method
2010
·
Tsuyoshi Amano
, Noriaki Takagi
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
9
Residual-type mask defect printability for extreme ultraviolet lithography
2012
·
Tsuyoshi Amano
, Susumu Iida
, et al.
·
Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena
·
8
Native pattern defect inspection of EUV mask using advanced electron beam inspection system
2010
·
Takeya Shimomura
, Yuichi Inazuki
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
7
Pattern decomposition for double patterning from photomask viewpoint
2007
·
Nobuhito Toyama
, Takashi Adachi
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
7
In-field CD uniformity control by altering transmission distribution of the photomask using ultra-fast pulsed laser technology
2006
·
Yasutaka Morikawa
, Takanori Sutou
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
7
Development status of back-end process for UV-NIL template fabrication
2008
·
Yuichi Inazuki
, Kimio Itoh
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
6
Pupil plane analysis on AIMS 45-193i for advanced photomasks
2007
·
Yasutaka Morikawa
, Takanori Sutou
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
5
Lithographic performance comparison with various RET for 45-nm node with hyper NA
2006
·
Takashi Adachi
, Yuichi Inazuki
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
5
Evanescent light photopolymerization and measurement of cure depth in nanostereolithography
2008
·
Y. Kajihara
, Y. Inazuki
, et al.
·
Applied Physics Letters
·
4
Analysis of diffraction orders including mask topography effects for OPC optimization
2007
·
Yuichi Inazuki
, Nobuhito Toyama
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
4
Challenge for under 40nm size pattern making for EUV mask
2013
·
Tsukasa Abe
, Yuichi Inazuki
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
2
Characterization of line-width roughness about 22-32nm node EUV mask
2010
·
Yuichi Inazuki
, Tsukasa Abe
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
2
Estimating DPL photomask fabrication load compared with single exposure
2007
·
Nobuhito Toyama
, Yuichi Inazuki
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
2
45-32-nm node photomask technology with water immersion lithography
2006
·
Takashi Adachi
, Yuichi Inazuki
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
2
NGL masks: development status and issue
2011
·
Naoya Hayashi
, Tsukasa Abe
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
EUV mask pattern inspection with an advanced electron beam inspection system
2009
·
Takeya Shimomura
, Yuichi Inazuki
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
DPL performance analysis strategy with conventional workflow
2007
·
Nobuhito Toyama
, Yuichi Inazuki
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
Approach to analyze decomposition impact for photomask fabrication
2007
·
Nobuhito Toyama
, Takashi Adachi
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
Characteristics optimization of mask materials for hyper-NA lithography
2007
·
Yasutaka Morikawa
, Takanori Suto
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
Investigation of the influence of resist patterning on absorber LWR for 22-nm-node EUV lithography
2010
·
Yuichi Inazuki
, Takeya Shimomura
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Mask CD compensation method using diffraction intensity for lithography equivalent metrology
2008
·
Takaharu Nagai
, Takanori Sutou
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Mask CD measurement approach by diffraction intensity for lithography equivalent
2008
·
Takaharu Nagai
, Kei Mesuda
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
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Works count:
27
Citation count:
115
H-index:
7
I10-index:
3
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