Characterization of line-width roughness about 22-32nm node EUV mask
Year: 2010
Type: conference-paper
DOI: 10.1117/12.867910
Authors: Yuichi Inazuki, Tsukasa Abe, Tadahiko Takikawa, Hiroshi Mohri, Naoya Hayashi
Institution: Dai Nippon Printing (Japan)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2015552249