Work

Pattern decomposition for double patterning from photomask viewpoint

Year: 2007

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.711915

Authors: Nobuhito Toyama, Takashi Adachi, Yuichi Inazuki, Takanori Sutou, Yasutaka Morikawa, Hiroshi Mohri, Naoya Hayashi

Institution: Dai Nippon Printing (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W2014005374

FWCI: 3.013

Cites:

Cited by: 7

Related to: 10