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Low VT CMOS using doped Hf-based oxides, TaC-based Metals and Laser-only Anneal

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Year: 2007
Type: conference-paper
Source: Technical digest - International Electron Devices Meeting/Technical digest
DOI: 10.1109/iedm.2007.4418860
Authors: S. Kubicek, T. Schram, V. Paraschiv, R. Vos, M. Demand, C. Adelmann, T. Witters, L. Nyns, L.-A. Ragnarsson, H. Yu, A. Veloso, R. Singanamalla, T. Kauerauf, E. Rohr, S. Brus, C. Vrancken, V. S. Chang, R. Mitsuhashi, A. Akheyar, H.-J. Cho, J. C. Hooker, B. J. O'Sullivan, T. Chiarella, C. Kerner, A. Delabie, S. Van Elshocht, K. De Meyer, S. De Gendt, P. Absil, T. Hoffmann, S. Biesemans
Institutions: IMEC, KU Leuven, Taiwan Semiconductor Manufacturing Company (United States)
Language: English

Topic: Semiconductor materials and devices
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences

Open Access status: closed
OpenAlex ID: W1985397007
FWCI: 4.519
Cites: 2
Cited by: 18
Related to: 10
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