Work

Calibrated nanoscale dopant profiling using a scanning microwave microscope

Year: 2012

Type: article

Source: Journal of Applied Physics

DOI: 10.1063/1.3672445

Authors: H. P. Huber, I. Humer, M. Hochleitner, M. Fenner, M. Moertelmaier, C. Rankl, A. Imtiaz, T. M. Wallis, H. Tanbakuchi, P. Hinterdorfer, P. Kabos, J. Smoliner, J. J. Kopanski, F. Kienberger

Institutions: Johannes Kepler University of Linz, TU Wien, Agilent Technologies (United States), National Institute of Standards and Technology

Language: English

Topic: Integrated Circuits and Semiconductor Failure Analysis

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1985559635

FWCI: 7.603

Cites: 23

Cited by: 95

Related to: 10