Work

Plasma Etching of Composite Silicide Gate Electrodes

Year: 1982

Type: article

Source: Journal of The Electrochemical Society

DOI: 10.1149/1.2124130

Authors: F. R. White, C. W. Koburger, D. L. Harmon, H. J. Geipel

Institution: IBM (United States)

Language: English

Topic: Low-Pressure Plasma Processing and Diagnostics

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1986003273

FWCI: 2.726

Cites:

Cited by: 13

Related to: 10