Work

A Theoretical Analysis of Electromigration Failure in Aluminum Interconnections

Year: 2006

Type: article

Source: Japanese Journal of Applied Physics

DOI: 10.1143/jjap.45.5716

Authors: Takenao Nemoto, A. Toshimitsu Yokobori, Jr., Tsutomu Murakawa

Institution: Tohoku University

Language: English

Topic: Copper Interconnects and Reliability

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funders: Conselho Nacional de Desenvolvimento Científico e Tecnológico, Fundação Carlos Chagas Filho de Amparo à Pesquisa do Estado do Rio de Janeiro

OpenAlex ID: W1986397408

FWCI: 0.545

Cites: 3

Cited by: 9

Related to: 10