Work

Fluorinated silicon nitride film for the bottom antireflective layer in quarter micron optical lithography

Year: 1997

Type: article

Source: Semiconductor Science and Technology

DOI: 10.1088/0268-1242/12/7/026

Authors: Byung-Hyuk Jun, Sang-Soo Han, Joon Sung Lee, Yong-Beom Kim, Ho-Young Kang, Young-Bum Koh, Zhong-Tao Jiang, Byeong-Soo Bae, Kwangsoo No

Institutions: Korea Advanced Institute of Science and Technology, Samsung Electronics (South Korea)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1991836668

FWCI: 0.962

Cites: 5

Cited by: 3

Related to: 10