Work

Generation of arbitrary freeform source shapes using advanced illumination systems in high-NA immersion scanners

Year: 2010

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.847282

Authors: Jörg Zimmermann, Paul Gräupner, Jens T. Neumann, Dirk Hellweg, Dirk Jürgens, Michael Patra, Christoph Hennerkes, Manfred Maul, Bernd Geh, Andre Engelen, Oscar Noordman, Melchior Mulder, Sean Park, Joep De Vocht

Institutions: Carl Zeiss (Germany), ASML (United States), ASML (Netherlands)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: U.S. Department of Energy

OpenAlex ID: W1991969730

FWCI: 3.85

Cites:

Cited by: 28

Related to: 10