Work

Surface diffusion during thin film annealing studied by XPS

Year: 1993

Type: article

Source: Surface Science

DOI: 10.1016/0039-6028(93)91096-8

Authors: Arjen Bot, Udo van Slooten, Wim R. Koppers, Aart W. Kleyn

Institution: Institute for Atomic and Molecular Physics

Language: English

Topic: Electron and X-Ray Spectroscopy Techniques

Subfield: Surfaces, Coatings and Films

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funder: Agencia Estatal de Investigación

OpenAlex ID: W1993645784

FWCI: 1.505

Cites: 6

Cited by: 6

Related to: 10