Work

Optimization of dissolution-rate characteristics of chemically amplified positive resist

Year: 1995

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.210399

Authors: Toshiro Itani, Haruo Iwasaki, Hiroshi Yoshino, Masashi Fujimoto, Kunihiko Kasama

Institution: NEC (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1994034896

FWCI: 5.521

Cites:

Cited by: 8

Related to: 10