Author

M. Fujimoto

Observed names: Fujimoto, M., M FUJIMOTO, Masashi FUJIMOTO, Masashi Fujimoto, Masashi Fujimoto Masashi Fujimoto

Observed institutions: Nihon University, NEC (Japan), Osaka Prefecture University, Gunma University, Kyushu Institute of Technology, Kyoto University, Oki Electric Industry (Japan), Kochi University of Technology, NEC (United States), Renesas Electronics (Japan), Toyota AUTO BODY Co., Ltd. (Japan), Kansai University, The University of Osaka

OpenAlex ID: A5113596756

Growth and Characterization of Ferroelectric Pb(Zr,Ti)OM3 Thin Films by Mocvd Using A 6 Inch Single Wafer Cvd System

1993 · Masaru Shimizu, Masashi Fujimoto, et al. · MRS Proceedings · 34

Growth and Properties of PbTiO3 Thin Films by Photoenhanced Chemical Vapor Deposition

1991 · Takuma Katayama, Masashi Fujimoto, et al. · Japanese Journal of Applied Physics · 33

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Photoacid bulkiness effect on dissolution kinetics in chemically amplified deep ultraviolet resists

1995 · Toshiro Itani, Hiroshi Yoshino, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 27

Dissolution Kinetics Analysis for Chemically Amplified Deep Ultraviolet Resist

1994 · Toshiro Itani, Haruo Iwasaki, et al. · Japanese Journal of Applied Physics · 17

A study on transverse stability loss of planing craft at super high forward speed

2007 · Toru Katayama, M. Fujimoto, et al. · International Shipbuilding Progress · 15

Large-area growth of Pb(Zr,Ti)O3 thin films by MOCVD

1994 · Tadashi Shiosaki, Masashi Fujimoto, et al. · Integrated ferroelectrics · 12

Construction of a yeast cell fusion system using a fluid integrated circuit

1991 · Naoto Urano, Minoru Kamimura, et al. · Journal of Biotechnology · 11

Photo-MOCVD of PbTiO3 thin films

1991 · Takuma Katayama, Masashi Fujimoto, et al. · Journal of Crystal Growth · 10

Comparison between optical proximity effect of positive and negative tone patterns in KrF lithography

1997 · Masashi Fujimoto, Takeo Hashimoto, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8

Optimization of dissolution-rate characteristics of chemically amplified positive resist

1995 · Toshiro Itani, Haruo Iwasaki, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8

Halide-ion conductivities of the complexes of cryptand[2.2.2] with alkali-metal halides and alkaline earth metal halides

1984 · M FUJIMOTO, T NOGAMI, et al. · Solid State Ionics · 7

Elimination of Resist Poisoning in Via-First Dual Damascene Processes

2003 · Seiji Nagahara, Masashi Fujimoto, et al. · Journal of Photopolymer Science and Technology · 6

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Three-dimensional physical photoresist model calibration and profile-based pattern verification

2010 · Mohamed Talbi, Amr Y. Abdo, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

Acid size effect of chemically amplified negative resist on lithographic performance

1994 · Haruo Iwasaki, Toshiro Itani, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

Development of the KT-wood space truss system with round timber as a new structural material

2002 · K. Imai, Y. Fujita, et al. · 3

Reticle Critical Dimension Latitude for Fabrication of 0.18 µm Line Patterns

1998 · Seiji Matsuura, Takayuki Uchiyama, et al. · Japanese Journal of Applied Physics · 3

Importance of resist transparency and development rate control in via-first dual damascene processes

2002 · Seiji Nagahara, Masashi Fujimoto, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

Convenient Stress Concentration Formula Useful for Any Shape of Fillet. Tension of a Stepped Round Bar with Fillet.

2001 · Nao-Aki NODA, Yasushi TAKASE, et al. · TRANSACTIONS OF THE JAPAN SOCIETY OF MECHANICAL ENGINEERS Series A · 2

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Dissolution characteristics optimization for chemically amplified positive resist

1994 · Toshiro Itani, Haruo Iwasaki, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

The investigation for introduction of SAC etching technique to mass productive DRAM process

2002 · S. Sekiyama, Y. Motoyama, et al. · IEEE International Symposium on Semiconductor Manufacturing conference proceedings · 1

Effect of stage synchronization error of KrF scan on 0.18-μm patterning

1998 · Takayuki Uchiyama, Takeo Hashimoto, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

DOF enhancement of isolated line patterns by newly developed assistant pattern method

1997 · Seiji Matsuura, Takeo Hashimoto, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Growth of PbTiO 3 films by photo-MOCVD

1991 · Masaru Shimizu, Takuma Katayama, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

CSD 1937162: Experimental Crystal Structure Determination

2019 · Fukui, H., Fujimoto, M., et al. · The Cambridge Structural Database

CSD 1937160: Experimental Crystal Structure Determination

2019 · Fukui, H., Fujimoto, M., et al. · The Cambridge Structural Database

Works count: 76

Citation count: 212

H-index: 8

I10-index: 8