Work

Dissolution characteristics optimization for chemically amplified positive resist

Year: 1994

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.175330

Authors: Toshiro Itani, Haruo Iwasaki, Masashi Fujimoto, Kunihiko Kasama

Institution: NEC (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1997454153

FWCI:

Cites:

Cited by: 2

Related to: 10