Work

Inductively coupled plasma application to the resist ashing

Year: 2001

Type: article

Source: Thin Solid Films

DOI: 10.1016/s0040-6090(00)01636-9

Authors: Ken-ichi Takagi, Akihiro Ikeda, Tsuyoshi Fujimura, Yukinori Kuroki

Institution: Kyushu University

Language: English

Topic: Low-Pressure Plasma Processing and Diagnostics

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1994409384

FWCI: 1.202

Cites: 4

Cited by: 21

Related to: 10