Work

The factors affecting improvement sensitivity, CDU, and resolution in EUV resist

Year: 2014

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.2046573

Authors: Joonhee Han, Hyun Soon Lim, Jin Ho Kim, Sumi Choi, Jin Bong Shin, Chang Wan Bae, In Young Yoo, Bong Ha Shin, Eun Kyo Lee, Hyun Sang Joo, Dong Chul Seo, Jun Sung Chun

Institution: Kumho Petrochemical (South Korea)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1994409784

FWCI: 0.401

Cites: 6

Cited by: 2

Related to: 10