Work

A new chemical etch for defects studies in very thin film (< 1000 Å) SIMOX material

Year: 1993

Type: article

Source: Materials Chemistry and Physics

DOI: 10.1016/0254-0584(93)90187-q

Authors: L.F. Giles, A. Nejim, P.L.F. Hemment

Institution: University of Surrey

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1998208221

FWCI: 2.402

Cites: 7

Cited by: 17

Related to: 10