Work

Characterization of fluoropolymers for 157 nm chemically amplified resist

Year: 2001

Type: article

Source: Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

DOI: 10.1116/1.1412889

Authors: Toshiro Itani, Minoru Toriumi, Takuya Naito, Seiichi Ishikawa, Seiro Miyoshi, Tamio Yamazaki, Manabu Watanabe

Institution: Semiconductor Leading Edge Technologies, Inc (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1998679081

FWCI: 1.602

Cites: 9

Cited by: 8

Related to: 10