Work

Reduced narrow-width effects in a scaled local oxidation of silicon process

Year: 1985

Type: article

Source: Canadian Journal of Physics

DOI: 10.1139/p85-146

Authors: David A. Baglee, M. P. Duane, M. C. Smayling

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1998968441

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