Work

Lithography options for the 32nm half pitch node and their implications on resist and material technology

Year: 2007

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.779273

Authors: Roel Gronheid, Eric Hendrickx, Vincent Wiaux, Mireille Maenhoudt, Mieke Goethals, Geert Vandenberghe, Kurt Ronse

Institution: IMEC

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Paul Scherrer Institut

OpenAlex ID: W2000454316

FWCI: 5.021

Cites: 10

Cited by: 11

Related to: 10