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Wafer-scale layer transfer of GaAs and Ge onto Si wafers using patterned epitaxial lift-off

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Year: 2015
Type: article
Source: Japanese Journal of Applied Physics
DOI: 10.7567/jjap.54.036505
Authors: Eiko Mieda, Tatsuro Maeda, Noriyuki Miyata, Tetsuji Yasuda, Yuichi Kurashima, Atsuhiko Maeda, Hideki Takagi, Takeshi Aoki, Taketsugu Yamamoto, Osamu Ichikawa, Takenori Osada, Masahiko Hata, Arito Ogawa, Toshiyuki Kikuchi, Yasuo Kunii
Institutions: National Institute of Advanced Industrial Science and Technology, Sumitomo Chemical (Japan), KOKUSAI ELECTRIC Corporation (Japan)
Language: English

Topic: 3D IC and TSV technologies
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences

Open Access status: closed

Funder: European Space Agency
OpenAlex ID: W2000675013
FWCI: 1.958
Cites: 33
Cited by: 25
Related to: 10
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