Bottom‐Up Engineering of Subnanometer Copper Diffusion Barriers Using NH2‐Derived Self‐Assembled Monolayers
Year: 2010
Type: article
Source: Advanced Functional Materials
Institutions: IMEC, KU Leuven, European Cooperation in Science and Technology
Language: English
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2000785224
