Work

Damage-free extreme ultraviolet mask with TaBN absorber

Year: 2003

Type: article

Source: Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

DOI: 10.1116/1.1610004

Authors: Tsutomu Shoki, Takeru Kinoshita, Noriyuki Sakaya, Morio Hosoya, Ryo Ohkubo, Yoh-ich Usui, Hideo Kobayashi, Osamu Nagarekawa

Institution: Hoya (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2001592020

FWCI: 0.331

Cites: 6

Cited by: 6

Related to: 10