Author

Noriyuki Sakaya

Observed names: N. SAKAYA, N. Sakaya, Noriyuki SAKAYA, Noriyuki sakaya

Observed institutions: Japan Science and Technology Agency, Centre de Recherche en Économie et Statistique, Institute of Laser Engineering, The University of Osaka, Hoya (Japan), The University of Osaka

OpenAlex ID: A5048859087

Investigation of soft X-ray emission from a gas puff target irradiated with a Nd:YAG laser

1999 · Henryk Fiedorowicz, Andrzej Bartnik, et al. · Optics Communications · 85

Novel Evaluation System for Extreme Ultraviolet Lithography Resist in NewSUBARU

2005 · Takeo Watanabe, Hiroo Kinoshita, et al. · Japanese Journal of Applied Physics · 41

Full characterization of a high-gain saturated x-ray laser at 13.9 nm

2000 · S. Sebban, H. Daido, et al. · Physical Review A · 31

Mask defect inspection using an extreme ultraviolet microscope

2005 · K. Hamamoto, Y. Tanaka, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 28

Improvement of total quality on EUV mask blanks toward volume production

2010 · Tsutomu Shoki, Masaru Mitsui, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 27

Cleaning of extreme ultraviolet lithography optics and masks using 13.5nm and 172nm radiation

2005 · K. Hamamoto, Y. Tanaka, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 27

Experimental characterization of short-wavelength Ni-like soft-x-ray lasing toward the water window

1999 · H. Daido, S. Sebban, et al. · Journal of the Optical Society of America B · 20

Phase Defect Observation Using Extreme Ultraviolet Microscope

2006 · Kazuhiro Hamamoto, Yuzuru Tanaka, et al. · Japanese Journal of Applied Physics · 16

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X-ray emission from laser-irradiated gold targets with surface modulation

2001 · T. DESAI, H. DAIDO, et al. · Laser and Particle Beams · 16

Actinic Mask Inspection Using an EUV Microscope –Preparation of a Mirau Interferometer for Phase-Defect Detection–

2005 · Kazuhiro Hamamoto, Yuzuru Tanaka, et al. · Japanese Journal of Applied Physics · 15

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Investigation of Contamination Removal from Finished EUVL Mask

2003 · Kazuhiro Hamamoto, Shintaro Takada, et al. · Journal of Photopolymer Science and Technology · 13

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Direct Evaluation of Surface Roughness of Substrate and Interfacial Roughness in Molybdenum/Silicon Multilayers Using Extreme Ultraviolet Reflectometer

2007 · Morio Hosoya, Noriyuki Sakaya, et al. · Japanese Journal of Applied Physics · 12

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Resolution Enhancement of Extreme Ultraviolet Microscope Using an Extreme Ultraviolet Beam Splitter

2008 · Masafumi Osugi, Kazuumi Tanaka, et al. · Japanese Journal of Applied Physics · 11

Cleaning Characteristics of Contaminated Imaging Optics Using 172 nm Radiation

2007 · Kazuumi Tanaka, Kazuhiro Hamamoto, et al. · Japanese Journal of Applied Physics · 10

Fabrication of programmed phase defects on EUV multilayer blanks

2003 · Takeru Kinoshita, Tsutomu Shoki, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9

Phase defect observation using an EUV microscope

2006 · Kazuhiro Hamamoto, Yuzuru Tanaka, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8

Evaluating the Optical Index of Ta and Ta-Based Absorbers for an Extreme Ultraviolet Mask Using Extreme Ultraviolet Reflectometry

2008 · Morio Hosoya, Noriyuki Sakaya, et al. · Japanese Journal of Applied Physics · 7

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Development of optical component for EUV phase-shift microscopes

2007 · Yoshio Mizuta, Masafumi Osugi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6

Damage-free extreme ultraviolet mask with TaBN absorber

2003 · Tsutomu Shoki, Takeru Kinoshita, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 6

Evaluation of extreme-ultraviolet lithography mask absorber pattern on multilayer phase defect using extreme-ultraviolet microscope

2009 · K. Hamamoto, N. Sakaya, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 5

Development of Beam Splitter Using Multilayer Membrane for Extreme Ultraviolet Phase-Shift Microscopes

2005 · Nobuyuki Hosokawa, Takeo Watanabe, et al. · Japanese Journal of Applied Physics · 4

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Development of low damage mask making process on EUV mask with thin CrN buffer layer

2005 · Mitsuhiro Kureishi, Ryo Ohkubo, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

Study on exposure contrast of an EUV mask

2003 · Morio Hosoya, Tsutomu Shoki, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

Studies on collisional pumping of soft X-ray lasers at ILE

1999 · S. Sebban, H. Daido, et al. · IEEE Journal of Selected Topics in Quantum Electronics · 4

Outgassing Characteristics of Structural Materials and the Removal of Contaminants from EUVL Masks using 172-nm Radiation

2004 · Kazuhiro Hamamoto, Yuzuru Tanaka, et al. · Journal of Photopolymer Science and Technology · 3

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Works count: 44

Citation count: 423

H-index: 12

I10-index: 14