Work

Development of low damage mask making process on EUV mask with thin CrN buffer layer

Year: 2005

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.598613

Authors: Mitsuhiro Kureishi, Ryo Ohkubo, Morio Hosoya, Tsutomu Shoki, Noriyuki Sakaya, Hideo Kobayashi, Osamu Nozawa, Yoh-ichi Usui, Osamu Nagarekawa

Institution: Hoya (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Intel Corporation

OpenAlex ID: W2010497159

FWCI: 1.688

Cites: 4

Cited by: 4

Related to: 10