Work

Progressions in deep-ultraviolet bottom antireflective coatings

Year: 2000

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.388256

Authors: George E. Bailey, Nicholas K. Eib, Earnest C. Murphy

Institution: Brewer Science (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Bhabha Atomic Research Centre

OpenAlex ID: W2002189169

FWCI:

Cites:

Cited by: 3

Related to: 10