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Nicholas K. Eib

Observed names: N. EIB, N. Eib, N. K. EIB, N. K. Eib, N.K Eib, Nicholas K. Eib, Nicholas Eib, Nicholas K Eib
OpenAlex ID: A5034697296
Inelastic electron tunneling spectroscopic study of the silane coupling agents: 1—Aminophenyltrimethoxysilane adsorbed on plasma grown aluminum oxide and effects of high humidity
1982 · T. Furukawa, N. K. Eib, et al. · Surface and Interface Analysis · 30
Inelastic electron tunneling spectroscopic study of the silane coupling agents II. γ-aminopropyltriethoxysilane adsorbed from vapor on aluminum oxide surface and effects of high humidity
1983 · T Furukawa, N.K Eib, et al. · Journal of Colloid and Interface Science · 21
Thermal distribution and the effect on resist sensitivity in electron-beam direct write
1989 · Nicholas K. Eib, Richard J. Kvitek · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 18
Wettability studies of plasma‐polymerized hexamethyldisilazane
1980 · N. K. Eib, K. L. Mittal, et al. · Journal of Applied Polymer Science · 17
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Design of a bottom antireflective layer for optical lithography
1994 · James T. Fahey, Wayne M. Moreau, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 14
Formation of SiH bonds when SiO is deposited on alumina
1979 · N. K. Eib, A. N. Gent, et al. · The Journal of Chemical Physics · 13
Inelastic Electron Tunneling Spectroscopy of Coupling Agents
1979 · H. T. CHU, N. K. EIB, et al. · Advances in chemistry series · 11
Complementary logic with 60 nm poly gate JFET for 0.5 V operation
2010 · A.K. Kapoor, W. Zhang, et al. · Electronics Letters · 9
Electron tunneling and band structure in Bi and dilute Bi-Sb alloys
1975 · H. T. Chu, N. K. Eib, et al. · Physical review. B, Solid state · 8
Electron Resist Process Modeling
1987 · N. EIB, D. KYSER, et al. · Elsevier eBooks · 7
Digital low noise dc power supply for tunneling spectrometers
1984 · N. K. Eib, T. Furukawa, et al. · Review of Scientific Instruments · 7
Characterization and simulation of acid-catalyzed DUV positive photoresist
1993 · Nicholas K. Eib, Eytan Barouch, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
Energy deposition in ultrathin extreme ultraviolet resist films: extreme ultraviolet photons and keV electrons
2016 · David F. Kyser, Nicholas K. Eib, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 5
Achieving mask-based imaging with optical maskless lithography
2006 · Elizabeth M. Stone, Jason D. Hintersteiner, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
Etching on silicon membranes for sub-0.25-μm x-ray mask manufacturing
1993 · K. Paul Muller, Nicholas K. Eib, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 5
Novel DNQ PACs for high-resolution i-line lithography
1992 · William R. Brunsvold, Nicholas K. Eib, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Modeling highly nonlinear resists
1985 · Nicholas K. Eib · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 4
Progressions in deep-ultraviolet bottom antireflective coatings
2000 · George E. Bailey, Nicholas K. Eib, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Electron beam tool/resist interdependence
1983 · Nicholas K. Eib, Fletcher Jones · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 3
Magnetic field effect on electron tunneling and band structure in bismuth
1978 · P. T. Chu, N. K. Eib, et al. · Physical review. B, Condensed matter · 3
Strong phase-shifting optical maskless lithography for the 65 nm node and beyond
2005 · Nicholas K. Eib, Ebo Croffie · Optical Microlithography XVIII · 2
Achieving sub-half-micron i-line manufacturability through automated OPC
1997 · Mario S. Garza, Eric Jackson, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Error budget for a 193-nm complementary phase-shift mask
2002 · Nicholas K. Eib, Olga Kobozeva, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
TAR processing for CD control in I-line and 248-nm lithography
1993 · Christopher F. Lyons, Nicholas K. Eib, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Advanced i-line resist performance with and without phase-shift masks
1992 · Nicholas K. Eib, Eytan Barouch, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Works count: 31
Citation count: 201
H-index: 8
I10-index: 7
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