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Advanced i-line resist performance with and without phase-shift masks

Year: 1992

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.130313

Authors: Nicholas K. Eib, Eytan Barouch, Uwe Hollerbach, Steven A. Orszag

Institutions: IBM (United States), Princeton University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2018117488

FWCI:

Cites:

Cited by: 1

Related to: 10