Work

Electron beam tool/resist interdependence

Year: 1983

Type: article

Source: Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena

DOI: 10.1116/1.582739

Authors: Nicholas K. Eib, Fletcher Jones

Institutions: IBM (United States), IBM Research - Thomas J. Watson Research Center

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2012263575

FWCI:

Cites:

Cited by: 3

Related to: 10