Work

Implantation profiles modified by sputtering

Year: 1973

Type: article

Source: Radiation Effects

DOI: 10.1080/00337577308232223

Authors: E. F. Krimmel, H. Pfleiderer

Institution: Siemens (Germany)

Language: English

Topic: Ion-surface interactions and analysis

Subfield: Surfaces, Coatings and Films

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2002244531

FWCI: 0.86

Cites: 5

Cited by: 32

Related to: 10