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E. F. Krimmel
Observed names:
E . F. Krimmel,
E. Krimmel,
E.F. Krimmel,
EF Krimmel
Observed institutions:
Goethe University Frankfurt,
Siemens (Germany),
Aristotle University of Thessaloniki,
University of Johannesburg,
European Materials Research Society,
University of Tübingen
show all 6
OpenAlex ID:
A5113620389
Photon, beam and plasma enhanced processing
1987
·
A. Golański
, Van Tran Nguyen
, et al.
·
Editions de Physique eBooks
·
53
Implantation profiles modified by sputtering
1973
·
E. F. Krimmel
, H. Pfleiderer
·
Radiation Effects
·
32
In situ detection of rearrangement processes during electron beam annealing of ion implanted InP
1993
·
C. Maurer
, R. Kallweit
, et al.
·
Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms
·
29
Chemical bonding and interface analysis of ultrathin silicon-nitride layers produced by ion implantation and Electron Beam Rapid Thermal Annealing (EB-RTA)
1994
·
A. Markwitz
, H. Baumann
, et al.
·
Applied Physics A
·
28
Hydrogen profiles of thin PVD silicon nitride films using elastic recoil detection analysis
1992
·
A. Markwitz
, M. Bachmann
, et al.
·
Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms
·
28
Investigations of ultrathin silicon nitride layers produced by low-energy ion implantation and EB-RTA
1994
·
A. Markwitz
, H. Baumann
, et al.
·
Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms
·
27
Change of surface structure of thin silicon nitride layers during electron beam rapid thermal annealing
1994
·
A. Markwitz
, H. Baumann
, et al.
·
Applied Physics Letters
·
25
Measurement of Contact Potential Differences by Electron Interferometry
1964
·
E. Krimmel
, G. Möllenstedt
, et al.
·
Applied Physics Letters
·
25
Nitrogen profiles of thin sputtered PVD silicon nitride films
1993
·
A Markwitz
, H Baumann
, et al.
·
Vacuum
·
24
Kinetics of scanned electron beam annealing of high-energy as ion implanted silicon
1981
·
E. F. Krimmel
, H. Oppolzer
, et al.
·
physica status solidi (a)
·
24
Low-energy 15N implantation in carbon for the synthesis of carbon nitride layers
1996
·
F. Link
, H. Baumann
, et al.
·
Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms
·
17
Characterisation of thin sputtered silicon nitride films by NRA, ERDA, RBS and SEM
1993
·
A. Markwitz
, H. Baumann
, et al.
·
Analytical and Bioanalytical Chemistry
·
13
Height control of silicon nano-whiskers embedded in ultra thin silicon nitride layers by rapid thermal annealing
2001
·
A. Markwitz
, H. Baumann
, et al.
·
Physica E Low-dimensional Systems and Nanostructures
·
10
Silicon nitride in microelectronics and solar cells
1991
·
E. F. Krimmel
, A. Pebler
, et al.
·
Springer eBooks
·
10
Surface-near analyses of ultra thin silicon nitride layers by NRA, channeling RBS, FT IR ellipsometry and AFM
1995
·
A. Markwitz
, H. Baumann
, et al.
·
Analytical and Bioanalytical Chemistry
·
9
Contribution to time-resolved enhanced chemical etching and simultaneous annealing of ion implantation amorphized silicon under intense laser irradiation
1985
·
E. F. Krimmel
, A. G. K. Lutsch
, et al.
·
Applied Physics A
·
9
Transmission electron microscopical imaging of lateral implantation effects near mask edges in B+-implanted Si wafers
1978
·
E.F. Krimmel
, H. Oppolzer
, et al.
·
Revue de Physique Appliquée
·
9
Annealing mechanism of radiation damage and dopants in pulsed laser light irradiated ion implanted layers
1979
·
W. Heywang
, E. F. Krimmel
, et al.
·
physica status solidi (a)
·
8
Elektronen-Interferenzen in der Umgebung der Brennlinie einer magnetischen Quadrupollinse
1961
·
E. Krimmel
·
The European Physical Journal A
·
8
Layer and interface analysis of ultra thin ion beam produced silicon nitride layers by NRA and TEM
1996
·
A. Markwitz
, S. Klein
, et al.
·
Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms
·
7
Bilder lokaler Aufladungen im Elektronen-Spiegelmikroskop
1963
·
F. Lenz
, E. Krimmel
·
The European Physical Journal A
·
7
Koh�rente Teilung eines Elektronenstrahls durch Magnetfelder
1960
·
E. Krimmel
·
The European Physical Journal A
·
7
Contribution to electron beam annealing of high-dose ion-implanted polysilicon
1982
·
E. F. Krimmel
, A. G. K. Lutsch
, et al.
·
physica status solidi (a)
·
6
Resistors and diodes produced by Al-implantation in silicon
1975
·
H. Runge
, E.F. Krimmel
·
Solid-State Electronics
·
6
New Method for Determining Activation Energies Applied to Substages III Annealing of Au‐Ion Irradiated Au Films
1969
·
E. F. Krimmel
·
physica status solidi (b)
·
6
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Works count:
58
Citation count:
486
H-index:
12
I10-index:
14
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